Growth of Lanthanum Oxide Thin Films by Liquid Injection MOCVD Using a Novel Lathanum Alkoxide Precursor-Reference-Cited by-同舟云学术

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Growth of Lanthanum Oxide Thin Films by Liquid Injection MOCVD Using a Novel Lathanum Alkoxide Precursor

Published:2004-01-16 Issue:1 Volume:10 Page:13-17
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Aspinall H.C.,Gaskell J.,Williams P.A.,Jones A.C.,Chalker P.R.,Marshall P.A.,Smith L.M.,Crichlow G.W.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Cited by 33 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Air-Stable Gadolinium Precursors for the Facile Microwave-Assisted Synthesis of Gd2O3 Nanocontrast Agents for Magnetic Resonance Imaging;Crystal Growth & Design;2018-01-18

2. Effects of rare earth oxide additive on surface and tribological properties of polyimide composites;Applied Surface Science;2017-09

3. Preparation of Lanthanum Oxide and Lanthanum Oxycarbonate Layers on Titanium by Electrodeposition with Organic Solution;Journal of Nanomaterials;2016

4. Metal-Organic Chemical Vapor Deposition of Metal Oxide Films and Nanostructures;Ceramics Science and Technology;2014-05-23

5. ‘Old Chemistries’ for new applications: Perspectives for development of precursors for MOCVD and ALD applications;Coordination Chemistry Reviews;2013-12

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