An MOCVD Approach to High-k Praseodymium-Based Films-Reference-Cited by-同舟云学术

An MOCVD Approach to High-k Praseodymium-Based Films

Published:2006-03 Issue:2-3 Volume:12 Page:109-124
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Lo Nigro R.,Malandrino G.,Toro R. G.,Fragalà I. L.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference112 articles.

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