Author:
Alexandrov S. E.,Hitchman M. L.
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Reference64 articles.
1. D. W. Hess, D. B. Graves, in Chemical Vapor Deposition: Principles and Applications (Eds: M. L. Hitchman, K. E. Jensen), Academic Press, London 1993, Ch. 7.
2. J. R. Roth, Industrial Plasma Engineering, Vol. 2, IOP, Bristol, UK 2001.
3. Generation of large-volume, atmospheric-pressure, nonequilibrium plasmas
4. Non-thermal atmospheric pressure discharges
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