MOCVD of Epitaxial PbO Films Below 400 °C Using Water Vapor
Author:
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Reference13 articles.
1. Plasma deposition of optical films and coatings: A review
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3. Molecular design of improved precursors for the MOCVD of electroceramic oxides
4. Oxidizer partial pressure window for YBa2Cu3O7−xthin film formation by metalorganic chemical vapor deposition
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