Electron Rutherford back-scattering case study: oxidation and ion implantation of aluminium foil
Author:
Publisher
Wiley
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference16 articles.
1. Electron inelastic mean free path in solids as determined by electron Rutherford back-scattering
2. Investigation of binary compounds using electron Rutherford backscattering
3. Elastic electron scattering at high momentum transfer: A possible new analytic tool
4. High-resolution study of quasi-elastic electron scattering from a two-layer system
5. elsepa—Dirac partial-wave calculation of elastic scattering of electrons and positrons by atoms, positive ions and molecules
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