Transparent and Reusable Nanostencil Lithography for Organic–Inorganic Hybrid Perovskite Nanodevices

Abstract

AbstractOrganic—inorganic hybrid perovskites have attracted considerable attention for developing novel optoelectronic devices owing to their excellent photoresponses. However, conventional nanolithography of hybrid perovskites remains a challenge because they undergo severe damage in standard lithographic solvents, which prohibits device miniaturization and integration. In this study, a novel transparent stencil nanolithography (t‐SL) technique is developed based on focused ion beam (FIB)‐assisted polyethylene terephthalate (PET) direct patterning. The proposed t‐SL enables ultrahigh lithography resolution down to 100 nm and accurate stencil mask alignment. Moreover, the stencil mask can be reused more than ten times, which is cost‐effective for device fabrication. By applying this lithographic technique to hybrid perovskites, a high‐performance 2D hybrid perovskite heterostructure photodetector is fabricated. The responsivity and detectivity of the proposed heterostructure photodetector can reach up to 28.3 A W−1 and 1.5 × 1013 Jones, respectively. This t‐SL nanolithography technique based on FIB‐assisted PET direct patterning can effectively support the miniaturization and integration of hybrid‐perovskite‐based electronic devices.