Constructing a Thin Disordered Self‐Protective Layer on the LiNiO 2 Primary Particles Against Oxygen Release

Author:

Chen Jinniu1,Yang Yang2,Tang Yushu3,Wang Yifan4,Li Hang4,Xiao Xianghui2,Wang Suning14,Darma Mariyam Susana Dewi4,Etter Martin5,Missyul Alexander6,Tayal Akhil5,Knapp Michael4,Ehrenberg Helmut4,Indris Sylvio4,Hua Weibo14ORCID

Affiliation:

1. School of Chemical Engineering and Technology Xi'an Jiaotong University Xi'an Shaanxi 710049 China

2. National Synchrotron Light Source II (NSLS‐II) Brookhaven National Laboratory Upton NY 11973 USA

3. Institute of Nanotechnology (INT) Karlsruhe Institute of Technology (KIT) Hermann‐von‐Helmholtz‐Platz 1 76344 Eggenstein‐Leopoldshafen Germany

4. Institute for Applied Materials (IAM) Karlsruhe Institute of Technology (KIT) Hermann‐von‐Helmholtz‐Platz 1 D‐76344 Eggenstein‐Leopoldshafen Germany

5. Deutsches Elektronen‐Synchrotron (DESY) Notkestr. 85 22607 Hamburg Germany

6. CELLS‐ALBA Synchrotron Cerdanyola del Valles E‐08290 Barcelona Spain

Funder

National Natural Science Foundation of China

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

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