High‐Detectivity UV–Visible–NIR Broadband Polymer Photodetector with Polymer Charge Blocking Layer Cross‐Linked by Organic Photocrosslinker

Author:

Jung Hyocheol12,Nguyen Tai1,Kim Soyeon3,Lee Jae Woong4,Yu Hyeonggeun56,Park Junsung5,Lim Chanwoo5,Lee Jihoon37,Kim Do Young1ORCID

Affiliation:

1. School of Materials Science and Engineering Oklahoma State University Tulsa Oklahoma 74106 USA

2. Center for Specialty Chemicals Division of Specialty and Bio‐Based Chemicals Technology Korea Research Institute of Chemical Technology (KRICT) Ulsan 44412 Republic of Korea

3. Department of IT·Energy Convergence (BK21 FOUR) Korea National University of Transportation Chungju 27469 Republic of Korea

4. Advanced Process and Materials R&BD Group Korea Institute of Industrial Technology Incheon 21999 Republic of Korea

5. Advanced Photovoltaics Research Center Korea Institute of Science and Technology Seoul 02792 Republic of Korea

6. Nanoscience and Technology KIST School University of Science and Technology Seoul 02792 Republic of Korea

7. Department of Polymer Science and Engineering Korea National University of Transportation Chungju 27469 Republic of Korea

Abstract

AbstractUltraviolet (UV), visible, and near‐infrared (NIR) broadband organic photodetectors are fabricated by sequential solution‐based thin film coatings of a polymer electron blocking layer (EBL) and a polymer photoactive layer. To avoid damage to a preceding polymer EBL during a subsequent solution‐based film coating of a polymer photoactive layer due to lack of solvent orthogonality, 2‐(((4‐azido‐2,3,5,6‐tetrafluorobenzoyl)oxy)methyl)−2‐ethylpropane‐1,3‐diyl bis(4‐azido‐2,3,5,6‐tetrafluorobenzoate) (FPA‐3F) is used as a novel organic cross‐linking agent activated by UV irradiation with a wavelength of 254 nm. Solution‐processed poly[N,N′‐bis(4‐butylphenyl)‐N,N′‐bis(phenyl)‐benzidine] (poly‐TPD) films, which are cross‐linked with a FPA‐3F photocrosslinker, are used for a preceding polymer EBL. A ternary blend film composed of PTB7‐Th, COi8DFIC, and PC71BM is used as a NIR‐sensitive organic photoactive layer with strong photosensitivity in multispectral (UV–visible–NIR) wavelengths of 300–1,050 nm. Poly‐TPD films are successfully cross‐linked even with a very small amount of 1 wt% FPA‐3F. Small amounts of FPA‐3F have little detrimental effect on the electrical and optoelectronic properties of the cross‐linked poly‐TPD EBL. Finally, organic NIR photodetectors with a poly‐TPD EBL cross‐linked by the small addition of FPA‐3F (1 wt%) show the detectivity values higher than 1 × 1012 Jones for the entire UV–visible–NIR wavelengths from 300 nm to 1050 nm, and the maximum detectivity values of 1.41 × 1013 Jones and 8.90 × 1012 Jones at the NIR wavelengths of 900 and 1000 nm, respectively.

Funder

National Science Foundation

National Aeronautics and Space Administration

Ministry of Trade, Industry and Energy

Korea Research Institute of Chemical Technology

National Research Foundation of Korea

Korea Institute of Science and Technology

Publisher

Wiley

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