A magnetron sputter deposition chamber for in-situ investigation of multilayer film growth using a state of the art Laboratory Diffractometer-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

A magnetron sputter deposition chamber for in-situ investigation of multilayer film growth using a state of the art Laboratory Diffractometer

Published:2007-08 Issue:8 Volume:204 Page:2792-2797
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:phys. stat. sol. (a)

Author:

Ringpfeil Clemens,Lützenkirchen-Hecht Dirk,Frahm Ronald

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings

2. Trends in sputtering

3. Characteristics of ZnO thin films deposited onto Al/Si substrates by r.f. magnetron sputtering

4. Reactive sputter deposition of chromium nitride coatings

5. Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP