Author:
Frey S.,Keipert S.,Chazalviel J.-N.,Ozanam F.,Carstensen J.,Föll H.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference5 articles.
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4. Ionic processes through the interfacial oxide in the anodic dissolution of silicon
5. G. Mende, in: Semiconductor Micromachining, Vol. 2, edited by S. A. Campbell and H. J. Lewerenz (Wiley, New York, 1998), chap. 2.
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