A high‐throughput and machine learning resistance monitoring system to determine the point of resistance for Escherichia coli with tetracycline: Combining UV‐visible spectrophotometry with principal component analysis-Reference-Cited by-同舟云学术

A high‐throughput and machine learning resistance monitoring system to determine the point of resistance for Escherichia coli with tetracycline: Combining UV‐visible spectrophotometry with principal component analysis

Published:2021-01-21 Issue:4 Volume:118 Page:1511-1519
ISSN:0006-3592
Container-title:Biotechnology and Bioengineering
language:en
Short-container-title:Biotechnol Bioeng

Author:

Chapman James¹^ORCID,Orrell‐Trigg Rebecca¹^ORCID,Kwoon Ki Y.²,Truong Vi K.¹²^ORCID,Cozzolino Daniel³^ORCID

Affiliation:

1. Department of Applied Chemistry and Environmental Science School of Science, RMIT University Melbourne Victoria Australia

2. Department of Chemical and Biomolecular Engineering North Carolina State University Raleigh North Carolina USA

3. Centre for Nutrition and Food Sciences, Queensland Alliance for Agriculture and Food Innovation (QAAFI) The University of Queensland Brisbane Queensland Australia

Publisher

Wiley

Subject

Applied Microbiology and Biotechnology,Bioengineering,Biotechnology

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/bit.27664

Reference61 articles.

1. Growth behavior of microorganisms using UV-Vis spectroscopy:Escherichia coli

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5. The unexhausted potential of E. coli

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