Formation of SiO2 Dendritic Structures During Annealing of Silicon on Insulator Wafers-Reference-Cited by-同舟云学术

Formation of SiO2 Dendritic Structures During Annealing of Silicon on Insulator Wafers

Published:2018-10-29 Issue:3 Volume:216 Page:1800509
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Korobova Natalia¹,Zhigalov Vlad¹,Novikov Sergey¹,Timoshenkov Sergey¹

Affiliation:

1. National Research University of Electronic Technology, MIET; Bld. 1, Shokin Square Zelenograd Moscow 124498 Russia

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssa.201800509/fullpdf

Reference24 articles.

1. Silicon-on-insulator: materials aspects and applications

2. Silicon-on-Insulator Technology: Materials to VLSI

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