Surface Grating Fabrication by Inductively Coupled Plasma Dry Etching for InP-Based Photonic Integrated Circuits-Reference-Cited by-同舟云学术

Surface Grating Fabrication by Inductively Coupled Plasma Dry Etching for InP-Based Photonic Integrated Circuits

Published:2018-07-11 Issue: Volume: Page:
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Zhang Juan¹,Sun Changzheng¹,Xiong Bing¹,Zheng Yanzhen¹,Wang Jian¹,Hao Zhibiao¹,Wang Lai¹,Han Yanjun¹,Li Hongtao¹,Luo Yi¹,Xiao Yi²,Yu Chuanqing²,Tanemura Takuo²,Nakano Yoshiaki²

Affiliation:

1. Beijing National Research Centre for Information Science and Technology (BNRist); Department of Electronic Engineering; Tsinghua University; Beijing 100084 China

2. Integrated Photonics Laboratory; Department of Electrical Engineering and Information Systems; Graduate School of Engineering; the University of Tokyo; Tokyo 113-8656 Japan

Funder

National Basic Research Program of China

National Natural Science Foundation of China

Tsinghua University Initiative Scientific Research Program

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssa.201800406/fullpdf

Reference17 articles.

1. InP Photonic Integrated Circuits

2. High Performance InP-Based Photonic ICs—A Tutorial

3. InP photonic circuits using generic integration [Invited]

4. AlGaInAs/InP Monolithically Integrated DFB Laser Array

5. Narrow Linewidth 1550 nm Corrugated Ridge Waveguide DFB Lasers

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