Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties-Reference-Cited by-同舟云学术

Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties

Published:2015-12-02 Issue:2 Volume:213 Page:470-480
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Baggetto Loïc¹,Charvillat Cédric¹,Thébault Yannick¹,Esvan Jérôme¹,Lafont Marie‐Christine¹,Scheid Emmanuel²,Veith Gabriel M.³,Vahlas Constantin¹

Affiliation:

1. Centre Inter‐universitaire de Recherche et d'Ingéniérie des Matériaux (CIRIMAT)UMR5085 CNRS4 allée Emile Monso, BP‐4436231030Toulouse Cedex 4France

2. Laboratoire d'Analyse et d'Architecture des Systèmes (LAAS)CNRS7 Avenue du colonel Roche31400ToulouseFrance

3. Materials Science and Technology DivisionOak Ridge National Laboratory1 Bethel Valley RoadOak Ridge37831TNUSA

Funder

Fondation STAE

U.S. Department of Energy

Basic Energy Sciences

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.201532838

Reference37 articles.

1. A change of direction

2. γ‐Alumina as a Support for Catalysts: A Review of Fundamental Aspects

3. CVD of Al2O3 Thin Films Using Aluminum Tri-isopropoxide

4. Growth of γ-Al2O3 thin films on silicon by low pressure metal-organic chemical vapour deposition

5. Nanoparticles of gold on -AlO produced by dc magnetron sputtering

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