Modification of reactively sputtered NiOxthin films by pulsed UV laser irradiation-Reference-Cited by-同舟云学术

Modification of reactively sputtered NiOxthin films by pulsed UV laser irradiation

Published:2016-11-02 Issue:2 Volume:214 Page:1600414
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Itapu Srikanth¹,Georgiev Daniel G.¹,Uprety Prakash²,Podraza Nikolas J.²

Affiliation:

1. Department of Electrical Engineering and Computer Science; University of Toledo; Toledo OH 43606 USA

2. Department of Physics and Astronomy and Wright Center for Photovoltaics Innovation and Commercialization; University of Toledo; Toledo OH 43606 USA

Funder

Electrical Engineering and Computer Science

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssa.201600414/fullpdf

Reference56 articles.

1. Laser irradiation of amorphous thin films

2. Site-Selective Passivation of Defects in NiO Solar Photocathodes by Targeted Atomic Deposition

3. Interaction and ordering of vacancy defects in NiO

4. Field-emission properties of sharp high-aspect-ratio gold cones formed via single pulse laser irradiation

5. Focused ion beam and electron microscopy characterization of nanosharp tips and microbumps on silicon and metal thin films formed via localized single-pulse laser irradiation

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