Epitaxial lateral overgrowth of Ga x In1 − x P toward direct Ga x In1 − x P/Si heterojunction

Author:

Omanakuttan Giriprasanth1,Stergiakis Stamoulis1,Sahgal Abhishek12,Sychugov Ilya1,Lourdudoss Sebastian1,Sun Yan-Ting1

Affiliation:

1. Department of Materials and Nano Physics, School of Information and Communication Technology; Royal Institute of Technology-KTH; Electrum 229 164 40 Kista Sweden

2. Department of Physics; Indian Institute of Technology Delhi; New Delhi 110016 India

Funder

Swedish Energy Agency

Erasmus Mundus India4EUII programme

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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2. Topical review: pathways toward cost-effective single-junction III–V solar cells;Journal of Physics D: Applied Physics;2021-12-03

3. Optical and interfacial properties of epitaxially fused GaInP/Si heterojunction;Journal of Applied Physics;2020-08-07

4. Heteroepitaxy of GaAsP and GaP on GaAs and Si by low pressure hydride vapor phase epitaxy;Journal of Crystal Growth;2020-06

5. Monolithic III/V integration on (001) Si substrate;Metalorganic Vapor Phase Epitaxy (MOVPE);2019-08-30

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