Conformal Low‐Temperature Molecular Layer Deposited Coatings as Interface Modifications to Support Ceramic Protective Films on Macroscopic Flexible Devices

Author:

Kalliomäki Jesse1ORCID,Manninen Ilkka1,Ritasalo Riina1,Hirsjärvi Samuli12

Affiliation:

1. Picosun Oy An Applied Materials Company Masalantie 365 02430 Masala Finland

2. Faculty of Pharmacy University of Helsinki Viikinkaari 5 E, PO Box 56 00014 Helsinki Finland

Abstract

Flexible devices often need a protective coating when operating in harmful environments, ranging from mild ambient conditions to a biologically active environment of the human body. The flexibility poses a problem for traditional encapsulation solutions, as those make the device bulky and limit functionality by applying an external casing. Alternatively, fully conformal encapsulation of a device of arbitrary shape can be realized with thin‐film encapsulation (TFE) without altering device dimensions. Yet, TFE is susceptible to fail under mechanical stresses, especially when a hard ceramic coating is applied on a polymer. Reliability of TFE can be enhanced by altering the elasticity of the hard and brittle thin films, by adding softer layers in between sample and barrier. Herein, molecular layer deposited (MLD) metal‐linked trioxysilylheptanoate (M‐TOSH) films are studied for coating of large devices to conformally and uniformly tune the interface between polymer and atomic‐layer‐deposited protective film. The results show that M‐TOSH process scales to large chambers; parameter optimization leads to superior film quality and lowers elastic modulus. Conformality, tested with home‐built macroscopic test device, finds the process suitable for 3D parts. Final testing reveals that ten cycles of MLD interlayer double the crack‐onset‐strain from 0.26% to 0.51%.

Funder

Business Finland

Publisher

Wiley

Reference55 articles.

1. J.Bakke Y.Lei Y.Xu K.Daito X.Fu G.Jian K.Wu R.Hung R.Jakkaraju N.Breil in2016 IEEE Inter. Interconnect Technology Conf./Advanced Metallization Conf. (IITC/AMC) IEEE San Jose CA USA2016 pp.108–110 https://doi.org/10.1109/IITC‐AMC.2016.7507699.

2. Three-dimensional silicon-integrated capacitor with unprecedented areal capacitance for on-chip energy storage

3. Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam Resist

4. A.Subramanian D. N.Le S. M.Hwang N.Tiwale W.-I.Lee K.Kisslinger M.Lu A.Stein J.Kim C.-Y.Nam inProc. of SPIE Advances in Patterning Materials and Processes XL2023 Vol.12498 p.1249810 https://doi.org/10.1117/12.2658685.

5. Molecular Layer Deposition on Carbon Nanotubes

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3