Affiliation:
1. Picosun Oy An Applied Materials Company Masalantie 365 02430 Masala Finland
2. Faculty of Pharmacy University of Helsinki Viikinkaari 5 E, PO Box 56 00014 Helsinki Finland
Abstract
Flexible devices often need a protective coating when operating in harmful environments, ranging from mild ambient conditions to a biologically active environment of the human body. The flexibility poses a problem for traditional encapsulation solutions, as those make the device bulky and limit functionality by applying an external casing. Alternatively, fully conformal encapsulation of a device of arbitrary shape can be realized with thin‐film encapsulation (TFE) without altering device dimensions. Yet, TFE is susceptible to fail under mechanical stresses, especially when a hard ceramic coating is applied on a polymer. Reliability of TFE can be enhanced by altering the elasticity of the hard and brittle thin films, by adding softer layers in between sample and barrier. Herein, molecular layer deposited (MLD) metal‐linked trioxysilylheptanoate (M‐TOSH) films are studied for coating of large devices to conformally and uniformly tune the interface between polymer and atomic‐layer‐deposited protective film. The results show that M‐TOSH process scales to large chambers; parameter optimization leads to superior film quality and lowers elastic modulus. Conformality, tested with home‐built macroscopic test device, finds the process suitable for 3D parts. Final testing reveals that ten cycles of MLD interlayer double the crack‐onset‐strain from 0.26% to 0.51%.
Reference55 articles.
1. J.Bakke Y.Lei Y.Xu K.Daito X.Fu G.Jian K.Wu R.Hung R.Jakkaraju N.Breil in2016 IEEE Inter. Interconnect Technology Conf./Advanced Metallization Conf. (IITC/AMC) IEEE San Jose CA USA2016 pp.108–110 https://doi.org/10.1109/IITC‐AMC.2016.7507699.
2. Three-dimensional silicon-integrated capacitor with unprecedented areal capacitance for on-chip energy storage
3. Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam Resist
4. A.Subramanian D. N.Le S. M.Hwang N.Tiwale W.-I.Lee K.Kisslinger M.Lu A.Stein J.Kim C.-Y.Nam inProc. of SPIE Advances in Patterning Materials and Processes XL2023 Vol.12498 p.1249810 https://doi.org/10.1117/12.2658685.
5. Molecular Layer Deposition on Carbon Nanotubes