Affiliation:
1. Mork Family Department of Chemical Engineering and Materials Science University of Southern California Los Angeles CA 90089 USA
2. Ming Hsieh Department of Electrical and Computer Engineering University of Southern California Los Angeles CA 90089 USA
3. Core Center for Excellence in Nano Imaging University of Southern California Los Angeles CA 90089 USA
Abstract
A home‐built compact system that functions as both a transfer stage for deterministic transfer processes and a mask aligner for contact photolithography, is constructed. The precision translation sample stage and optical microscope are shared between the two modes. In the transfer mode, assisted by either an adhesive or a heating element, the setup has been used to deterministically transfer freestanding semiconductors, 2D materials, and van der Waals electrodes. When configured in photolithography mode, the proposed instrument has been employed to fabricate various microscale patterns and devices, with minimum feature sizes of 1–2 μm achieved. The prototype instrument provides a feasible solution for performing high‐quality deterministic transfer and photolithography processes on one single tool in‐house.