Ellipsometry‐based approach for the characterization of mesoporous thin films for H 2 technologies-Reference-Cited by-同舟云学术

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Ellipsometry‐based approach for the characterization of mesoporous thin films for H 2 technologies

Published:2021-12-09 Issue: Volume: Page:
ISSN:1438-1656
Container-title:Advanced Engineering Materials
language:en
Short-container-title:Adv Eng Mater

Author:

Sachse René¹,Moor Maëlle²,Kraehnert Ralph³,Hodoroaba Vasile-Dan¹,Hertwig Andreas¹

Affiliation:

1. Federal Institute for Materials Research and Testing (BAM) Unter den Eichen 44‐46 12203 Berlin Germany

2. L’Ecole Nationale Supérieure de Chimie de Lille Av. Mendeleiev Villeneuve‐d’Ascq CEDEX 59652 France

3. Faculty II Mathematics and Natural Sciences Technische Universität Berlin Institute of Chemistry Straße des 17 Juni 135 10623 Berlin Germany

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adem.202101320

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Broadband Mueller ellipsometer as an all-in-one tool for spectral and temporal analysis of mutarotation kinetics;RSC Advances;2023

2. Application of imaging ellipsometry and white light interference microscopy for detection of defects in epitaxially grown 4H–SiC layers;Journal of the European Optical Society-Rapid Publications;2023

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