Metal Organic Chemical Vapor Deposition (MOCVD) Perspectives and Prospects-Reference-Cited by-同舟云学术

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Metal Organic Chemical Vapor Deposition (MOCVD) Perspectives and Prospects

Published:2006-01-13 Issue:8 Volume:101 Page:1136-1146
ISSN:0044-8249
Container-title:Angewandte Chemie
language:en
Short-container-title:Angewandte Chemie

Author:

Williams John O.

Publisher

Wiley

Subject

General Medicine

Reference61 articles.

1. TIME‐RESOLVED STIMULATED EMISSION SPECTRA OF AN ORGANIC DYE LASER

2. The Use of Metal-Organics in the Preparation of Semiconductor Materials

3. 1981 J. Cryst. Growth 55

4. 1984 J. Cryst. Growth 68

5. 1986 J. Cryst. Growth 77

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Theoretical and Experimental Studies on the Bond Dissociation Energies of Al(methane)+, Al(acetylene)+, Al(ethene)+, and Al(ethane)+;The Journal of Physical Chemistry;1996-01-01

2. Organometallic chemical vapor deposition of rare earth oxide thin films. Application for steel protection against high temperature oxidation;Solid State Ionics;1994-09

3. OMCVD neodymium oxide film effect on Z4CN18-09 (AISI 304) steel high-temperature corrosion behaviour;Solid State Ionics;1992-03

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