Author:
Nelson T. J.,Muehlner D. J.,Rana V. V. S.,Roman B. J.,Vella-Coleiro G. P.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Cited by
2 articles.
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1. Ion projection lithography for sub-micron modification of materials;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1987-01
2. Reactive ion etching of SiO2 with vertical sidewalls and its application to ion-implantation masks for bubble devices;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1985-11