Affiliation:
1. Vacuum Technology Research Group ACECR Sharif University Branch Tehran Iran
Subject
Surfaces, Coatings and Films,Condensed Matter Physics
Reference22 articles.
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4. A.B.M.Khairul Alam:Etching Process Development of SiO2 Etching Using Inductively Coupled Plasma Diss. MS Thesis. University of Eastern Finland Department of Physics 2015.
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3 articles.
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