Double Negative Differential Resistance Device Based on Hafnium Disulfide/Pentacene Hybrid Structure

Author:

Jung Kil‐Su12,Heo Keun3,Kim Min‐Je4,Andreev Maksim3,Seo Seunghwan3,Kim Jin‐Ok3,Lim Ji‐Hye3,Kim Kwan‐Ho3,Kim Sungho5,Kim Ki Seok67,Yeom Geun Yong7,Cho Jeong Ho8,Park Jin‐Hong13ORCID

Affiliation:

1. Department of Semiconductor and Display Engineering Sungkyunkwan University Suwon 440‐746 South Korea

2. Memory Technology Design Team Samsung Electronics Co. Hwasung 18448 South Korea

3. Department of Electrical and Computer Engineering Sungkyunkwan University Suwon 440‐746 South Korea

4. SKKU Advanced Institute of Nano Technology (SAINT) Sungkyunkwan University Suwon 440‐746 South Korea

5. Jet Propulsion Laboratory (JPL) California Institute of Technology Pasadena CA 91109 USA

6. Research Laboratory of Electronics Massachusetts Institute of Technology (MIT) Cambridge MA 02139‐4307 USA

7. School of Advanced Materials Science and Engineering Sungkyunkwan University Suwon 440‐746 South Korea

8. Department of Chemical and Biomolecular Engineering Yonsei University Seoul 120‐749 South Korea

Funder

National Research Foundation of Korea

Ministry of Science, ICT and Future Planning

Ministry of Trade, Industry and Energy

Publisher

Wiley

Subject

General Physics and Astronomy,General Engineering,Biochemistry, Genetics and Molecular Biology (miscellaneous),General Materials Science,General Chemical Engineering,Medicine (miscellaneous)

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