Momentum‐Space Imaging of Ultra‐Thin Electron Liquids in δ‐Doped Silicon

Author:

Constantinou Procopios123ORCID,Stock Taylor J. Z.14ORCID,Crane Eleanor14,Kölker Alexander14ORCID,van Loon Marcel12,Li Juerong5,Fearn Sarah16,Bornemann Henric12,D'Anna Nicolò3,Fisher Andrew J.12,Strocov Vladimir N.3ORCID,Aeppli Gabriel3789ORCID,Curson Neil J.14ORCID,Schofield Steven R.12ORCID

Affiliation:

1. London Centre for Nanotechnology University College London London WC1H 0AH UK

2. Department of Physics and Astronomy University College London London WC1E 6BT UK

3. Photon Science Division Paul Scherrer Institut Villigen‐PSI 5232 Switzerland

4. Department of Electronic and Electrical Engineering University College London London WC1E 7JE UK

5. Advanced Technology Institute University of Surrey Guildford GU2 7XH UK

6. Department of Materials Imperial College of London London SW7 2AZ UK

7. Institute of Physics Ecole Polytechnique Fédérale de Lausanne (EPFL) Lausanne 1015 Switzerland

8. Department of Physics ETH Zürich Zurich 8093 Switzerland

9. Quantum Center Eidgenössische Technische Hochschule Zurich (ETHZ) Zurich 8093 Switzerland

Abstract

AbstractTwo‐dimensional dopant layers (δ‐layers) in semiconductors provide the high‐mobility electron liquids (2DELs) needed for nanoscale quantum‐electronic devices. Key parameters such as carrier densities, effective masses, and confinement thicknesses for 2DELs have traditionally been extracted from quantum magnetotransport. In principle, the parameters are immediately readable from the one‐electron spectral function that can be measured by angle‐resolved photoemission spectroscopy (ARPES). Here, buried 2DEL δ‐layers in silicon are measured with soft X‐ray (SX) ARPES to obtain detailed information about their filled conduction bands and extract device‐relevant properties. This study takes advantage of the larger probing depth and photon energy range of SX‐ARPES relative to vacuum ultraviolet (VUV) ARPES to accurately measure the δ‐layer electronic confinement. The measurements are made on ambient‐exposed samples and yield extremely thin (< 1 nm) and dense (≈1014 cm−2) 2DELs. Critically, this method is used to show that δ‐layers of arsenic exhibit better electronic confinement than δ‐layers of phosphorus fabricated under identical conditions.

Funder

Engineering and Physical Sciences Research Council

Paul Scherrer Institut

Publisher

Wiley

Subject

General Physics and Astronomy,General Engineering,Biochemistry, Genetics and Molecular Biology (miscellaneous),General Materials Science,General Chemical Engineering,Medicine (miscellaneous)

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Adsorption and Thermal Decomposition of Triphenyl Bismuth on Silicon (001);The Journal of Physical Chemistry C;2023-08-14

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