High Performance Graphene–C60–Bismuth Telluride–C60–Graphene Nanometer Thin Film Phototransistor with Adjustable Positive and Negative Responses

Author:

Pan Rui12,Cai Yuanlingyun13,Zhang Feifei1,Wang Si1,Chen Lianwei1,Feng Xingdong13,Ha Yingli134,Zhang Renyan12,Pu Mingbo134,Li Xiong13,Ma Xiaoliang13,Luo Xiangang13ORCID

Affiliation:

1. State Key Laboratory of Optical Technologies on Nano‐Fabrication and Micro‐Engineering Institute of Optics and Electronics Chinese Academy of Sciences Chengdu 610209 P. R. China

2. Division of Frontier Science and Technology Institute of Optics and Electronics Chinese Academy of Sciences Chengdu 610209 P. R. China

3. School of Optoelectronics University of Chinese Academy of Sciences Beijing 100049 P. R. China

4. Research Center on Vector Optical Fields Institute of Optics and Electronics Chinese Academy of Sciences Chengdu 610209 P. R. China

Abstract

AbstractGraphene is a promising candidate for the next‐generation infrared array image sensors at room temperature due to its high mobility, tunable energy band, wide band absorption, and compatibility with complementary metal oxide semiconductor process. However, it is difficult to simultaneously obtain ultrafast response time and ultrahigh responsivity, which limits the further improvement of graphene photoconductive devices. Here, a novel graphene/C60/bismuth telluride/C60/graphene vertical heterojunction phototransistor is proposed. The response spectral range covers 400–1800 nm; the responsivity peak is 106 A W−1; and the peak detection rate and peak response speed reach 1014 Jones and 250 µs, respectively. In addition, the regulation of positive and negative photocurrents at a gate voltage is characterized and the ionization process in impurities of the designed phototransistor at a low temperature is analyzed. Tunable bidirectional response provides a new degree of freedom for phototransistors' signal resolution. The analysis of the dynamic change process of impurity energy level is conducted to improve the device's performance. From the perspective of manufacturing process, the ultrathin phototransistor (20–30 nm) is compatible with functional metasurface to realize wavelength or polarization selection, making it possible to achieve large‐scale production of integrated spectrometer or polarization imaging sensor by nanoimprinting process.

Publisher

Wiley

Subject

General Physics and Astronomy,General Engineering,Biochemistry, Genetics and Molecular Biology (miscellaneous),General Materials Science,General Chemical Engineering,Medicine (miscellaneous)

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