Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review
Author:
Affiliation:
1. The Institute of Technological Sciences Wuhan University Wuhan China
2. Yangtze Memory Technologies Co., Ltd. Wuhan China
3. Department of Mechanical and Aerospace Engineering Hong Kong University of Science and Technology Hong Kong China
Funder
National Natural Science Foundation of China
Publisher
Wiley
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/msd2.12010
Reference88 articles.
1. WronoskyJB SmithTG DarnoldJR.Development of a wafer positioning system for the Sandia extreme ultraviolet lithography tool; 1995.
2. Review of the wafer stage for nanoimprint lithography
3. Feasibility of Air Levitated Surface Stage for Lithography Tool
4. DYNAMIC CHARACTERISTIC ANALYSIS OF PRECISE LONG STROKE LINEAR MOTOR WITH AIR-BEARING IN OPTICAL LITHOGRAPHY
5. The dynamic analysis of the gas lubricated stage in optical lithography
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