NiFe Catalysts for Oxygen Evolution Reaction: Is There an Optimal Thickness for Generating a Dynamically Stable Active Interface?

Author:

Ciambriello Luca1,Alessandri Ivano234ORCID,Gavioli Luca1,Vassalini Irene234

Affiliation:

1. Interdisciplinary Laboratories for Advanced Materials Physics (i-LAMP) and Dipartimento di Matematica e Fisica, Università Cattolica del Sacro Cuore Via della Garzetta 46 25133 Brescia Italy

2. INSTM, UdR Brescia Italy

3. Department of Information Engineering (DII) University of Brescia via Branze 38 25123 Brescia Italy

4. INO-CNR via Branze 38 25123 Brescia Italy

Abstract

AbstractHere we investigated the dynamics of OER activity of NiFe (90/10) catalysts over 1000 potential sweep cycles as a function of their mass loading. Over twenty different films with mass loading in the 10 ng/cm2–30 μg/cm2 range were deposited by Supersonic Cluster Beam Deposition (SCBD), allowing to study the progress of OER in sub‐monolayer, monolayer and multilayer regimes. Upon prolonged potential sweeps the electrocatalytic performances of multilayers decreased, while those of monolayers were significantly improved. The best balance in terms of catalytic efficiency and stability in working conditions is found for mass loadings corresponding to a NiFe monolayer, corresponding to a mass loading around 1 μg/cm2 and a thickness of about 3 nm.

Publisher

Wiley

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