Ellipsometric studies on the interaction of oxygen with thin copper films at 460 K-Reference-Cited by-同舟云学术

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Ellipsometric studies on the interaction of oxygen with thin copper films at 460 K

Published:1988-07 Issue:7 Volume:12 Page:407-411
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Schmidt R.,Wißmann P.

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference46 articles.

1. and Low Energy Electrons and Surface Chemistry, Verlag Chemie, Weinheim (1985).

2. Oxygen chemisorption on copper single crystals

3. Oxygen adsorption on polycrystalline Cu films studied by means of gravimetric uptake and work function change

4. Oxygen interaction with Cu(100) studied by AES, ELS, Leed and work function changes

5. Photoemission studies of adsorbed oxygen and oxide layers

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1. In situ oxidation studies of Cu thin films: Growth kinetics and oxide phase evolution;Journal of Applied Physics;2020-02-14

2. Optical characterization of thin thermal oxide films on copper by ellipsometry;Applied Physics A: Materials Science & Processing;2002-09-01

3. Optical and electrical measurements on CO2 covered copper films;Fresenius' Journal of Analytical Chemistry;1995

4. The oxidation kinetics of thin copper films studied by ellipsometry;Thin Solid Films;1993-05

5. Structure investigations of pure and partially oxidized copper films;Fresenius' Journal of Analytical Chemistry;1991

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