Affiliation:
1. Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education) School of Physics and Astronomy Shanghai Jiao Tong University Shanghai 200240 P.R. China
2. School of Chemistry and Chemical Technology Shanghai Jiao Tong University Shanghai 200240 P.R. China
Abstract
AbstractThe g‐C3N4 decorated porous gallium phosphide have been fabricated by a facile electrophoretic deposition (EPD) process. The morphology, element composition and light absorption of the GaP/g‐C3N4 photoanode were observed using field‐emission scanning electron microscopy, X‐ray photoelectron spectroscopy, ultraviolet and visible spectrophotometer, respectively. When acting as photoanode, porous GaP/g‐C3N4 serves as a direct Z‐scheme system, where photogenerated holes in GaP are expended by electrons generated from the g‐C3N4, inhibiting the corrosion of GaP. Therefore, the porous GaP/g‐C3N4 showed a larger photocurrent density, which is 2.1 times as large as that of the porous GaP without g‐C3N4, and a more stable photocurrent density for over 10000 s (at 0 V vs RHE). Thus, this work delivers a practical way to improve the photoelectrochemical stability and property of III–V semiconductor materials, which could be used in solar energy conversion fields.
Funder
Science and Technology Commission of Shanghai Municipality
National Natural Science Foundation of China