A Facile Liquid Phase Exfoliation of Tungsten Diselenide using Dimethyl Sulfoxide as Polar Aprotic Solvent to Produce High‐quality Nanosheets-Reference-Cited by-同舟云学术

A Facile Liquid Phase Exfoliation of Tungsten Diselenide using Dimethyl Sulfoxide as Polar Aprotic Solvent to Produce High‐quality Nanosheets

Published:2021-02-11 Issue:3 Volume:7 Page:328-333
ISSN:2199-692X
Container-title:ChemNanoMat
language:en
Short-container-title:ChemNanoMat

Author:

Kashyap Pradeep Kumar¹²,Kumar Ashish¹²,Srivastava Ritu¹²,Gupta Sarika³,Gupta Bipin Kumar¹²^ORCID

Affiliation:

1. Photonic Materials Metrology Sub Division Advanced Materials and Device Metrology Division CSIR-National Physical Laboratory Dr. K. S. Krishnan Marg New Delhi 110012 India

2. Academy of Scientific and Innovative Research (AcSIR) Ghaziabad 201002 India

3. Molecular Sciences Laboratory National Institute of Immunology Aruna Asaf Ali Marg New Delhi 110067 India

Publisher

Wiley

Subject

Materials Chemistry,Energy Engineering and Power Technology,Renewable Energy, Sustainability and the Environment,Biomaterials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/cnma.202100020

Reference46 articles.

1. Two-Step Growth of Two-Dimensional WSe2/MoSe2 Heterostructures

2. Exfoliated MoS2 and MoSe2 Nanosheets by a Supercritical Fluid Process for a Hybrid Mg–Li-Ion Battery

3. Mechanical Exfoliation and Characterization of Single- and Few-Layer Nanosheets of WSe2, TaS2, and TaSe2

4. In situ immune response and mechanisms of cell damage in central nervous system of fatal cases microcephaly by Zika virus

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