c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films-Reference-Cited by-同舟云学术

c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films

Published:2014-02-12 Issue:3 Volume:11 Page:289-299
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Terriza Antonia¹,Macías-Montero Manuel¹,López-Santos Maria C.¹,Yubero Francisco¹,Cotrino José¹²,González-Elipe Agustín R.¹

Affiliation:

1. Laboratory of Nanotechnology on Surfaces; Instituto de Ciencia de Materiales de Sevilla (CSIC-Univ. Sevilla); Avda. Américo Vespucio 49 41092 Sevilla Spain

2. Departamento de Física Atómica; Molecular y Nuclear, Facultad de Física, Univ. Sevilla; Avda. Reina Mercedes 41012 Sevilla Spain

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference48 articles.

1. Diamond-like amorphous carbon

2. Nitrogen-Rich Plasma-Polymer Films for Biomedical Applications

3. Interpretation of Raman spectra of disordered and amorphous carbon

4. Resonant Raman spectroscopy of disordered, amorphous, and diamondlike carbon

5. Characteristics of nitrogen doped diamond-like carbon thin films grown by microwave surface-wave plasma CVD

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