Surface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface Wettability-Reference-Cited by-同舟云学术

Surface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface Wettability

Published:2013-05-22 Issue:7 Volume:10 Page:582-592
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Watanabe Hitoshi¹,Kondo Hiroki¹,Hiramatsu Mineo²,Sekine Makoto¹,Kumar Shailesh³,Ostrikov Kostya³,Hori Masaru¹

Affiliation:

1. Department of Electrical Engineering and Computer Science; Graduate School of Engineering, Nagoya University; C3-1 (631), Furo-cho Chikusa-ku; Nagoya; Aichi; 464-8603; Japan

2. Department of Electrical and Electronic Engineering; Meijo University; 468-8502; Japan

3. PlasmaNanoscience Center Australia (PNCA); CSIRO Materials Science and Engineering; P.O. Box 218; Lindfield New South Wales; 2070; Australia

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference36 articles.

1. Carbon Nanowalls Grown by Microwave Plasma Enhanced Chemical Vapor Deposition

2. Fabrication of vertically aligned carbon nanowalls using capacitively coupled plasma-enhanced chemical vapor deposition assisted by hydrogen radical injection

3. Estimation of Electrically-Pumped Dynamic Nuclear Polarization in a Quantum Hall Device Using Tilted Magnetic Fields

4. Free-standing subnanometer graphite sheets

5. Synthesis of Platinum Nanoparticles on Two-Dimensional Carbon Nanostructures with an Ultrahigh Aspect Ratio Employing Supercritical Fluid Chemical Vapor Deposition Process

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