Deposition and Characterization of a Low-ε r Thin Film Based on Plasma-Polymerized 4-Cumylphenol Cyanate Ester-Reference-Cited by-同舟云学术

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Deposition and Characterization of a Low-ε r Thin Film Based on Plasma-Polymerized 4-Cumylphenol Cyanate Ester

Published:2012-09-11 Issue:1 Volume:10 Page:41-50
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Processes Polym.

Author:

Zhao Xiong-Yan,Wang Ming-Zhu,Sun Zhan-Ying

Funder

Natural Science Foundation of Hebei Province

Education Department of Hebei Province, P. R. China

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201200064/fullpdf

Reference58 articles.

1. Analysis of Cu/Low-k structure under back end of line process

2. Porosity and structure evolution of a SiOCH low k material during post-etch cleaning process

3. Characterization of low-k SiOCH dielectric for 45nm technology and link between the dominant leakage path and the breakdown localization

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Cyanate ester resins;Handbook of Thermoset Plastics;2022

2. Cyanate Esters;Handbook of Thermoset Plastics;2014

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