Utilizing surface modification in plasma‐enhanced cyclic etching of tantalum nitride to surpass lithographic limits
Author:
Affiliation:
1. IBM TJ Watson Research Center Yorktown Heights New York
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.201900008
Reference21 articles.
1. Overview of atomic layer etching in the semiconductor industry
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