Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure
Author:
Affiliation:
1. Research Department Plasmas with Complex Interactions; Ruhr-Universität Bochum, Universitätsstr. 150; 44801 Bochum Germany
Funder
German Research Foundation
Ruhr-Universität Bochum
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201300059/fullpdf
Reference33 articles.
1. Atmospheric Pressure Low Temperature Direct Plasma Technology: Status and Challenges for Thin Film Deposition
2. High Quality SiO2-like Layers by Large Area Atmospheric Pressure Plasma Enhanced CVD: Deposition Process Studies by Surface Analysis
3. Use of a PECVD–PVD process for the deposition of copper containing organosilicon thin films on steel
4. Continuous Coating of Synthetic Fibers Using Hexamethyldisiloxane
5. Deposition of Hydrophobic Functional Groups on Wood Surfaces Using Atmospheric-Pressure Dielectric Barrier Discharge in Helium-Hexamethyldisiloxane Gas Mixtures
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