Deposition of aminosilane coatings on porous Al2 O3 microspheres by means of dielectric barrier discharges-Reference-Cited by-同舟云学术

Deposition of aminosilane coatings on porous Al2 O3 microspheres by means of dielectric barrier discharges

Author:

Garzia Trulli Marta¹,Claes Nathalie²,Pype Judith³,Bals Sara²,Baert Kitty⁴,Terryn Herman⁴,Sardella Eloisa⁵,Favia Pietro¹⁵,Vanhulsel Annick⁶⁷

Affiliation:

1. Department of Chemistry; University of Bari “Aldo Moro”; Bari Italy

2. Electron Microscopy for Materials Science (EMAT); University of Antwerp; Antwerp Belgium

3. Laboratory of Adsorption and Catalysis (LADCA), Department of Chemistry; University of Antwerp; Wilrijk Belgium

4. Research Group Electrochemical and Surface Engineering; Vrije Universiteit Brussel; Brussels Belgium

5. CNR-Institute of Nanotechnology (CNR-NANOTEC), URT Bari c/o Department of Chemistry; University of Bari “Aldo Moro”; Bari Italy

6. Materials Department; Flemish Institute for Technological Research (VITO); Boeretang Belgium

7. SIM (Strategic Initiative Materials Flanders) vzw; Zwijnaarde Belgium

Funder

Strategic Initiative Materials in Flanders (SIM)

European Research Council

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference47 articles.

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