Characteristics of Floating Potential in Negative Ion Plasma-Reference-Cited by-同舟云学术

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Characteristics of Floating Potential in Negative Ion Plasma

Published:2014-04-06 Issue:6 Volume:11 Page:545-550
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Zhang Jing Ying¹,Ichiki Ryuta²,Uchino Kiichiro³,Kawai Yoshinobu³

Affiliation:

1. School of Medicine; Dalian University; Dalian 116622 P. R. China

2. Department of Electrical and Electronic Engineering; Oita University; Oita 870-1192 Japan

3. Interdisciplinary Graduate School of Engineering Sciences; Kyushu University; Kasuga Fukuoka 816-8580 Japan

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Reference15 articles.

1. Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon

2. Direct visual observation of powder dynamics in rf plasma‐assisted deposition

3. Towards very low-cost mass production of thin-film silicon photovoltaic (PV) solar modules on glass

4. Large Area SiH4/H2 VHF Plasma Produced with Multi-Rod Electrode

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Propagation of Large-Amplitude Ion-Acoustic Double Layers in Warm Negative Ion Plasmas;IEEE Transactions on Plasma Science;2021-01

2. Sheath characteristics in a magnetically filtered low density low temperature multicomponent plasma with negative ions;Physics of Plasmas;2019-12

3. Investigation of Electron Cyclotron Resonance Chemical Vapor Deposition Process for a-Si:H Deposition, Film Characterization and In Situ Plasma Diagnostics;ECS Journal of Solid State Science and Technology;2015

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