High-Rate Deposition of Electrochromic Organotungsten Oxide Thin Films for Flexible Electrochromic Devices by Atmospheric Pressure Plasma Jet: The Effect of Substrate Distance
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201000116/fullpdf
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1. Cold atmospheric plasma: Sources, processes, and applications
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3. Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge
4. Plasma Polymerization of HMDSO with an Atmospheric Pressure Plasma Jet for Corrosion Protection of Aluminum and Low-Adhesion Surfaces
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