Photoinduced Dehalogenation‐Based Direct In Situ Photolithography of CsPbBr3 Quantum Dots Micropatterns for Encryption and Anti‐Counterfeiting with High Capacity

Author:

Li Wanting1,Wu Manchun1,Chen Haini1,Zhang Peng1,Cai Zhixiong1,Cai Shunyou1,Li Feiming1234ORCID

Affiliation:

1. College of Chemistry, Chemical Engineering & Environmental Science Minnan Normal University Zhangzhou 363000 China

2. Micro‐Nano Organic Optical Materials Laboratory Minnan Normal University Zhangzhou 363000 China

3. Fujian Province Key Laboratory of Modern Analytical Science and Separation Technology Minnan Normal University Zhangzhou 363000 China

4. Fujian Province Key Laboratory of Pollution Monitoring and Control Minnan Normal University Zhangzhou 363000 China

Abstract

Fluorescent lead halide perovskite quantum dots (LH PQDs) micropatterns hold great potential for photonic applications. However, current photolithography for LH PQDs micropatterning is hindered by their incompatibility with traditional photolithography methods, which involve development processes using numerous solvents and exhibit poor stability due to the ionic characteristics of LH PQDs. Herein, a direct in situ photolithography to fabricate CsPbBr3 PQDs micropatterns based on ultraviolet‐C light‐driven debromination is developed. Using this approach, fluorescent CsPbBr3 PQDs micropatterns with high theoretical information storage capacity (up to 10750205) can be achieved in a single step, without the need for tedious development processes. Furthermore, the fabricated CsPbBr3 PQDs micropatterns show high stability, remaining undamaged even after immersion in water for 6 months. The combination of excellent optical properties, development‐free process, high stability, and low cost makes the in situ photolithography strategy very promising for patterning LH PQDs toward photonic integrations.

Publisher

Wiley

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