Damage‐Free Depth Profiling of Electronic Structures in Multilayered Organic Semiconductors by Photoelectron Spectroscopy and Cluster Ion Beam-Reference-Cited by-同舟云学术

Damage‐Free Depth Profiling of Electronic Structures in Multilayered Organic Semiconductors by Photoelectron Spectroscopy and Cluster Ion Beam

Published:2021-09-06 Issue:11 Volume:258 Page:2100130
ISSN:0370-1972
Container-title:physica status solidi (b)
language:en
Short-container-title:Physica Status Solidi (b)

Author:

Hu Juntao¹²,Wang Dengke¹,Li Peicheng³,Chen Nan¹,Zhang Tao¹,Wu Yan¹,Wu Di¹,Zhao Yongbiao¹,Zhu Qiang¹,Fu Zewei²,Lu Zheng-Hong¹³^ORCID

Affiliation:

1. Department of Physics and Lakeside AR-VR Labs Center for Optoelectronics Engineering Research and Energy Materials Yunnan University Kunming 650091 P. R. China

2. Center of Development and Research Yunnan Tin Group (Holding) Co. Ltd. Kunming 650106 P. R. China

3. Department of Materials Science and Engineering University of Toronto Toronto M5S 3E4 Canada

Funder

National Natural Science Foundation of China

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssb.202100130

Reference20 articles.

1. Lithium and Stannum Hybrid Anodes for Flexible Wire‐Type Lithium–Oxygen Batteries

2. Mapping Energy Levels for Organic Heterojunctions

3. Effects of gas cluster ion beam sputtering on the molecular orientation of organic semiconductor films: Ultraviolet photoelectron spectroscopy study of [6]phenacene

4. Progress and applications of cluster ion beam technology

5. An electronic structure reinterpretation of the organic semiconductor/electrode interface based on argon gas cluster ion beam sputtering investigations

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