ChemInform Abstract: Synchrotron Radiation-Excited Chemical Vapor Deposition of Silicon Nitride Films from a SiH4 + NH3 Gas Mixture.
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Published:2010-08-22
Issue:4
Volume:23
Page:no-no
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ISSN:0931-7597
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Container-title:ChemInform
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language:en
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Short-container-title:ChemInform
Author:
KYURAGI H.,URISU T.