A Double Self-Assembly Process for Versatile Reduced-Graphene-Oxide Layer Deposition and Conformal Coating on 3D Structures-Reference-Cited by-同舟云学术

A Double Self-Assembly Process for Versatile Reduced-Graphene-Oxide Layer Deposition and Conformal Coating on 3D Structures

Published:2017-10-05 Issue:23 Volume:4 Page:1700758
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Jia Guobin¹^ORCID,Plentz Jonathan¹,Presselt Martin¹²,Dellith Jan¹,Dellith Andrea¹,Patze Sophie¹,Tölle Folke Johannes³,Mülhaupt Rolf³,Andrä Gudrun¹,Falk Fritz¹,Dietzek Benjamin¹

Affiliation:

1. Leibniz Institute of Photonic Technology; Albert-Einstein-Str. 9 07745 Jena Germany

2. Institute of Physical Chemistry and Abbe Center of Photonics; Friedrich-Schiller-University Jena; Helmholtzweg 4 07743 Jena Germany

3. Institute for Macromolecular Chemistry; Albert-Ludwigs University Freiburg; Stefan-Meier-Str. 31 79104 Freiburg Germany

Funder

Thüringer Aufbaubank

European Social Fund

European Commission

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Reference49 articles.

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3. All Graphene-Based Thin Film Transistors on Flexible Plastic Substrates

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5. Colloidal Antireflection Coating Improves Graphene–Silicon Solar Cells

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