MOCVD Approach to the Growth of Calcium Copper Titanate (CaCu3 Ti4 O12 ) Thin Films: The Role of the Substrate Nature on Film Structural and Dielectrical Properties-Reference-Cited by-同舟云学术

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MOCVD Approach to the Growth of Calcium Copper Titanate (CaCu3 Ti4 O12 ) Thin Films: The Role of the Substrate Nature on Film Structural and Dielectrical Properties

Published:2017-03-15 Issue:8 Volume:4 Page:1600975
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Lo Nigro Raffaella¹

Affiliation:

1. Istituto per la Microelettronica e Microsistemi (IMM); Consiglio Nazionale delle Ricerche (CNR); Strada VIII n 5 95121 Catania Italy

Funder

Europian Commission Union

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Reference68 articles.

1. Why Are There so Few Magnetic Ferroelectrics?

2. NANO-phase SBT-family ferroelectric memories

3. Lattice effects in magnetoresistive manganese perovskites

4. Chemical aspects of solution routes to perovskite-phase mixed-metal oxides from metal-organic precursors

5. Ferroelectric field-effect transistor with a SrRuxTi1−xO3 channel

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrochemistry of Thin Films and Nanostructured Materials;Molecules;2023-05-11

2. Near-infrared third-order optical nonlinearity in CaCu3Ti4O12 thin films;Journal of Nonlinear Optical Physics & Materials;2018-06

3. Effects of deposition temperatures and substrates on microstructure and optical properties of sputtered CCTO thin film;Materials Letters;2018-01

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