Metal on Graphenated Metal for VLSI Interconnects-Reference-Cited by-同舟云学术

Metal on Graphenated Metal for VLSI Interconnects

Published:2018-05-11 Issue:13 Volume:5 Page:1800270
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Narula Udit¹^ORCID,Tan Cher Ming²^ORCID,Tok Eng Soon³

Affiliation:

1. Center for Reliability Sciences & Technologies; Chang Gung University; 259, Wen-Hua 1st Road Kwei-Shan Tao-Yuan Taiwan 33302 Republic of China

2. Center for Reliability Sciences & Technologies; Department of Electronic Engineering; Chang Gung University; 259, Wen-Hua 1st Road Kwei-Shan Tao-Yuan Taiwan 33302 Republic of China

3. Electronic Materials Growth and Interface Characterization (eMaGIC) Laboratory; Department of Physics; National University of Singapore; 2 Science Drive 3 Singapore 117551 Singapore

Funder

Ministry of Science and Technology, Taiwan

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Reference70 articles.

1. International Technology Roadmap for Semiconductors, (ITRS), Interconnect Summary 2013

2. Interconnect scaling into the sub-10nm regime

3. Electromigration in ULSI Interconnections

4. Electric Field Effect in Atomically Thin Carbon Films

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