Wafer-Scale Highly Ordered Anodic Aluminum Oxide by Soft Nanoimprinting Lithography for Optoelectronics Light Management-Reference-Cited by-同舟云学术

Wafer-Scale Highly Ordered Anodic Aluminum Oxide by Soft Nanoimprinting Lithography for Optoelectronics Light Management

Published:2017-01-27 Issue:5 Volume:4 Page:1601116
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Zhang Chi¹²,Li Wenchao¹²,Yu Dongliang¹²,Wang Yanshan²,Yin Min²,Wang Hui²,Song Ye¹,Zhu Xufei¹,Chang Paichun³,Chen Xiaoyuan²,Li Dongdong²

Affiliation:

1. Key Laboratory of Soft Chemistry and Functional Materials of Education Ministry; Nanjing University of Science and Technology; Nanjing 210094 China

2. Shanghai Advanced Research Institute; Chinese Academy of Sciences; 99 Haike Road, Zhangjiang Hi-Tech Park Pudong Shanghai 201210 China

3. Laboratory of Materials Integration; Kainan University; No. 1, Kainan Road Taoyuan City 338 Taiwan

Funder

National Natural Science Foundation of China

Science and Technology Commission of Shanghai Municipality

CAS President's International Fellowship for Visiting Scientists

Youth Innovation Promotion Association of the Chinese Academy of Sciences

Youth Innovation Fund for Interdisciplinary Research of Shanghai Advanced Research Institute

Priority Academic Program Development of Jiangsu Higher Education Institutions

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Reference41 articles.

1. Formation of Anodic Aluminum Oxide with Serrated Nanochannels

2. The role of electric field in pore formation during aluminum anodization

3. Development and application of a holistic model for the steady state growth of porous anodic alumina films

4. Fabrication and structural control of anodic alumina films with inverted cone porous structure using multi-step anodizing

5. Morphological instability leading to formation of porous anodic oxide films

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