Low Temperature Epitaxial Barium Titanate Thin Film Growth in High Vacuum CVD-Reference-Cited by-同舟云学术

Low Temperature Epitaxial Barium Titanate Thin Film Growth in High Vacuum CVD

Published:2017-04-24 Issue:18 Volume:4 Page:1700116
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Reinke Michael¹²,Kuzminykh Yury¹²,Eltes Felix³,Abel Stefan³,LaGrange Thomas⁴,Neels Antonia⁵,Fompeyrine Jean³,Hoffmann Patrik¹²

Affiliation:

1. Laboratory for Advanced Materials Processing; Empa; Swiss Federal Laboratories for Materials Science and Technology; Feuerwerkerstrasse 39 CH-3602 Thun Switzerland

2. Laboratory for Photonic Materials and Characterization; Ecole Polytechnique Fédérale de Lausanne; Station 17 CH-1015 Lausanne Switzerland

3. IBM Research-Zurich; Säumerstrasse 4 CH-8803 Rüschlikon Switzerland

4. Interdisciplinary Centre for Electron Microscopy; Ecole Polytechnique Fédérale de Lausanne; Station 12 CH-1015 Lausanne Switzerland

5. Center for X-ray Analytics; Empa; Swiss Federal Laboratories for Materials Science and Technology; Überlandstrasse 129 CH-8600 Dübendorf Switzerland

Funder

Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung

Horizon 2020

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Reference31 articles.

1. History and challenges of barium titanate: Part I

2. History and challenges of barium titanate: Part II

3. Analysis of the Pockels effect in ferroelectric barium titanate thin films on Si(0 0 1)

4. Ferroelectric Epitaxial Thin Films for Integrated Optics

5. A strong electro-optically active lead-free ferroelectric integrated on silicon

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