Reaction and Energy Levels at Oxide–Oxide Heterojunction Interfaces-Reference-Cited by-同舟云学术

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Reaction and Energy Levels at Oxide–Oxide Heterojunction Interfaces

Published:2019-09-18 Issue:22 Volume:6 Page:1901456
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Kung Hao‐Ting¹^ORCID,Li Peicheng¹,Lee Jae‐Jin¹,Zhao Yongbiao²,Dumont Antoine¹,Lu Zheng‐Hong¹²³^ORCID

Affiliation:

1. Department of Materials Science and EngineeringUniversity of Toronto Toronto M5G 3E4 Canada

2. Department of PhysicsCenter for Optoelectronics Engineering ResearchYunnan University Kunming 650091 China

3. School of MicroelectronicsSouthern University of Science and Technology Shenzhen 518055 China

Funder

Natural Sciences and Engineering Research Council of Canada

National Natural Science Foundation of China

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.201901456

Reference42 articles.

1. Oxide Interfaces—An Opportunity for Electronics

2. Interface Physics in Complex Oxide Heterostructures

3. Universal energy-level alignment of molecules on metal oxides

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