Impact of Post‐Lithography Polymer Residue on the Electrical Characteristics of MoS 2 and WSe 2 Field Effect Transistors-Reference-Cited by-同舟云学术

Impact of Post‐Lithography Polymer Residue on the Electrical Characteristics of MoS 2 and WSe 2 Field Effect Transistors

Author:

Liang Jierui¹^ORCID,Xu Ke¹^ORCID,Toncini Blaec¹,Bersch Brian²,Jariwala Bhakti²,Lin Yu‐Chuan²,Robinson Joshua²,Fullerton‐Shirey Susan K.¹³^ORCID

Affiliation:

1. Department of Chemical and Petroleum Engineering University of Pittsburgh Pittsburgh PA 15260 USA

2. Department of Materials Science and Engineering The Pennsylvania State University University Park PA 16802 USA

3. Department of Electrical and Computer Engineering University of Pittsburgh Pittsburgh PA 15260 USA

Funder

National Science Foundation

Microelectronics Advanced Research Corporation

Defense Advanced Research Projects Agency

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

Reference56 articles.

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