Atomic Layer Deposition of p-Type Semiconducting Thin Films: a Review-Reference-Cited by-同舟云学术

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Atomic Layer Deposition of p-Type Semiconducting Thin Films: a Review

Published:2017-09-11 Issue:24 Volume:4 Page:1700300
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Tripathi Tripurari Sharan¹,Karppinen Maarit¹^ORCID

Affiliation:

1. Department of Chemistry and Materials Science; Aalto University; P.O. Box 16100 FI-00076 Espoo Finland

Funder

Strategic Research Council

Academy of Finland

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/admi.201700300/fullpdf

Reference245 articles.

1. Where science fiction meets reality? With oxide semiconductors!

2. p-channel thin-film transistor using p-type oxide semiconductor, SnO

3. Tin monoxide as an s-orbital-based p-type oxide semiconductor: Electronic structures and TFT application

4. Energy Levels, Electronic Properties, and Rectification in Ultrathin p-NiO Films Synthesized by Atomic Layer Deposition

5. The 2016 oxide electronic materials and oxide interfaces roadmap

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