Asymmetric Lattice Disorder Induced at Oxide Interfaces-Reference-Cited by-同舟云学术

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Asymmetric Lattice Disorder Induced at Oxide Interfaces

Published:2020-02-20 Issue:8 Volume:7 Page:1901944
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Spurgeon Steven R.¹^ORCID,Kaspar Tiffany C.²,Shutthanandan Vaithiyalingam³,Gigax Jonathan⁴,Shao Lin⁴,Sassi Michel²

Affiliation:

1. Energy and Environment Directorate Pacific Northwest National Laboratory Richland WA 99352 USA

2. Physical and Computational Sciences Directorate Pacific Northwest National Laboratory Richland WA 99352 USA

3. Environmental Molecular Sciences Laboratory Pacific Northwest National Laboratory Richland WA 99352 USA

4. Department of Nuclear Engineering Texas A&M University College Station TX 77843 USA

Funder

U.S. Department of Energy

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.201901944

Reference55 articles.

1. Advances in the growth and characterization of magnetic, ferroelectric, and multiferroic oxide thin films

2. Nanostructured Thin Film Solid Oxide Fuel Cells

3. Thin-film solid oxide fuel cell (SOFC) materials

4. Deposition and characterisation of epitaxial oxide thin films for SOFCs

5. Tuning piezoelectric properties through epitaxy of La2Ti2O7 and related thin films

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